Theory and Technology of Semiconductor Fabrication

Course description

Graduate-level treatment of the theory and technology of integrated-circuit fabrication: crystal growth, thermal oxidation, photolithography, etching, diffusion, ion implantation, film deposition and epitaxy, process integration (bipolar, MOS, CMOS, BiCMOS, MEMS), IC manufacturing and yield, and future trends. Lectures emphasise quantitative models (Scheil, Deal–Grove, Rayleigh, Fick, LSS, Grove CVD, Poisson yield) which students apply in eight virtual-lab experiments.

Format

• Fixed session (weekly): lecture with interactive widgets and quick-check quizzes.
• Circular session (every 2 weeks, Weeks 2, 4, … 16): virtual-lab experiment, data analysis and short report.
• Weeks 13–15: student seminars (CMOS / BiCMOS applications). Week 16: project presentations (MBE / MOCVD) and review.

Grading

Textbook

References